스핀코터(Spincoater)

마스크얼라이너(Mask Aligner)

 
Spincoater Home
Spin Processing System
               
Spin Processor   Spin Etcher   Spin Developer  EBR(Edge Bead Removal)  SpinDryer   SpinCoater
               
               
 
Spin Processor
     
 

Spin Processor

Spin Etcher

Spin Developer

EBR(Edge Bead Removal)

 

스핀프로세스 스테이션:
( Spin Process Station for Etching & Cleaning )
세정(식각), 클리닝, 드라잉     

Fully integrated cabinet for safe and clean etching or developing process

 

 

spin processor

Spin process Station JS-84EDR : 8인치 스핀프로세스 스테이션

-Manual loading unloading Dispensing Drying system
-Full Plastic Housing
- 4 Chemicals Etching , DI-Water Rinsing ,Spin Drying
-Temperature Control for Chemicls (0~70C)
-Max Substrate :최대 200 MM ,300mm,500mm(선택)
-Speed :1~2,000rpm RPM,
-Fixed dispencing spraying nozzles
-Chemical resistant bowl(PTFE) ,and Bath
-Chemical Flow Rate control by flow meters
-N2 or Clean air Dry Dispensor Nozzle
- 8" Chuck , 3cm x 3cm Chuck
-4 Dispensing 용 Tubing ,Nozzle( Bath with Heating System :상온 ~70C)
acid, alkali, organic solvent, organic solvent용
-DI-Water Rinsing Line :중앙 공급 라인용
-Nozzle Type : dispensing Type
-Programmable :Unlimited
-automatic chemical dispense, heavy duty motor, including:
- Touchscreen with Customisable Icons ,USB Port
- 1" Drainconnection
-Timer:0-999 seconds
-Tranaparent window
-Programmable Process Control for Speed, Time and step..Valve
- Dimension :1600Wx1000Dx1800H mm

 

 

spin-etcher  
spin-dispenser  

Fully integrated cabinet with double spin chambers for safe and clean coating & developing process

 

 

Coater equipped with:

  • Fully automated dosing pump
  • Dynamic movable dispense arm with constant or Rpm related speed control for maximum uniformity among whole substrate surface
  • Front and back side adjustable Edge Bead Removal
  • Nitrogen dry :optionally available through lid or movable arm
  • Digitally controlled brushless motor with highly accurate speed control and acceleration selectable per recipe step
   

 

 

Developer equipped with:

  • Fully automated top spray developing system with double contained lines
  • HD drive suitable for chemical saver “puddle” developing
  • Developer dispensed through dispense vessel
  • Substrate Front & Back Side In Situ Di Water Rinse with manually adjustable flow rate
  • Combined chamber rinse and purge system for safe access to process chamber
  • Selectable drain line with integrated drain canister for waste collecting

 

 

See also our other models:

Cleaning

Etching

 

Spin Process Station
 
Shop » Models » Stations크리닝 & 드라이용 스핀프로세서


 

 

     

Compact integrated solution in single cabinet:

  • Full 플래스틱 하우징 :10mm Thick NPP
  • 이지 프로세스 콘트롤이 가능한 투명 한 뚜껑
  • DI-water and Nitrogen spray Nozzle Located in
  • 개스 누출방지 설계적용
 

 

SpinDryer

SpinCoater

 

 

Coater equipped with:

  • Fully automated dosing pump
  • Dynamic movable dispense arm with constant or Rpm related speed control for maximum uniformity among whole substrate surface
  • Nitrogen dry :optionally available through lid or movable arm
  • Digitally controlled brushless motor with highly accurate speed control and acceleration selectable per recipe step
   

Portable Wand

Vacuum Wand Set

Vacuum tips

Vacuum Handles

     

Wafer 3-point mechanical gripper

Wafer Edge Pick

Applications:

  • Drying
  • Rinse/clean
  • Etching
  • Manual coating
  • Automatic coating
  • Developing

 

 

Aluminum Process Cassettes

Aluminum Box Cassettes

Stainless Steel Process Cassettes

Process Cassettes 300mm

     

Mask Pick - Side Grip

Mask Pick - Horizontal Grip

   
     

Manual Reticle SMIF Pod Opener, RSP150

Manual FOUP Opener, 300 mm

   
     

Automatic Wafer Presenter

Manual Five-Wafer Lift Presenter

Manual Single Wafer Presenter

21-manual-wafer-escalators

   
 


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