½ºÇÉÄÚÅÍ(Spincoater)

¸¶½ºÅ©¾ó¶óÀ̳Ê(Mask Aligner)

Spincoater Home
Spin Processing System
         
Spin Processor   Spin Etcher   Spin Developer  EBR(Edge Bead Removal)  SpinDryer   SpinCoater
         
         
Spin Rinse Dryer
     
 

Spin Processor

Spin Etcher

Spin Developer

EBR(Edge Bead Removal)

 

»ç°¢±âÆÇ EBR¿ë µð½ºÆæ¼­:
EBR for Glass,EBR(Edge Bead Removal)
     

¸ðµ¨ JS-3030ED ,»ç°¢±âÆÇ EBR¿ë µð½ºÆæ¼­

EBR
-»ç°¢±âÆÇ EBR ¿ë Àåºñ

-30mm x 30mm ½Ã·áÀÇ ¿¡ÁöºÎºÐÀ» ¸®¹«¹ú Çϱâ À§ÇÑ Àåºñ:( Á¦ÀÛ»çÀÌÁî ÇùÀÇ °¡´É)

-½Ã·á »çÀÌÁî :25 x 25mm , 30 x 30mm Glass, »çÀÌÁî Á¶Á¤ °¡´É

-2 Stepping Moter (±âÆÇ È¸Àü. ¹× xÃà ³ëÁñ À̵¿ )

-2³ëÁñ ÀåÂø (¼Ö·ù¼Ç,N2)

-±âÆÇ °íÁ¤ ¹æ½Ä :Áø°ø ÈíÂø °íÁ¤½Ä

-ÀçÁú :PP ¶Ç´Â SUS

-Removal Æø :2~5 mm

-Solution : IPA or ¸Þź¿Ã..

-½ºÇÁ·¹ÀÌ ºÐ»ç¹æ½Ä : ¾ÐÃà °ø±â ¹æ½Ä,ºÐ»ç ¾Ë·Â Á¶Àý ¹ëºê ÀåÂø

-¾Ð·Â º£½½ :1 liter ¿ë·®

-Timer ¼³Á¤ :0~999sec. µðÁöÅРŸÀ̸Ó

-µå·¹ÀÎÅë :20¸®ÅÍ

-Áø °ø: 0.5~0.8 Kg/CM2

-Àü ¿ø : AC 220V 50/60 Hz, 10A
-Ä¡¼ö : 600W X 600D X 400H mm :º¯µ¿°¡´É
-Áß ·®(º»Ã¼) : 20 Kg

 

 

 

 
   

Jsi-803ARD Spin Etcher, Rinsing Dryer,EBR(Edge Bead Removal)

-EBR¿ëµµ·Î »ç¿ë°¡´É(¿þÀÌÆÛ¿ë)

-Full Ç÷¡½ºÆ½ ÇÏ¿ì¡

-½Ã·á : ¿þÀÌÆÛ , ±Û·¡½º

-½Ã·áÅ©±â :Single wafer process, 6~12inch

-Acid-resistant materials and structure

-Etching ,Rinsing, Dry °¡´É
- 3 Nozzle, (1nozzle for Acid washing, 2nozzle for DI-Water Rinsing)
-Body & Bowl :PVC
-Max Substrate :ÃÖ´ë 200 MM ¥Õ 150mm x 150mm ,»çÀÌÁî Á¶Á¤°¡´É
-Speed :100~3000rpm RPM
-Acuracy :+-0.5%,Speed Control Motor
-Step :3steps,
-Timer:0-999 seconds
-±âº» Chuck Æ÷ÇÔ
Dimension : 430w*430h*370d mm :8ÀÎÄ¡ ±âÁØ
¿ëµµ:¿þÀÌÆÛ ,±Û¶ó½º ÄÚÆÃ, ¸°½Ì,

Manual Loading Spin coater JS ½Ã¸®Áî

±âÁ¾

½ºÇÉÄÚÅÍ
½ºÇÉ ¸°½º, µå¶óÀ̾î
½ºÇÉ µðº§·ÎÆÛ
½ºÇÉ¿¡Ã³
Remarks

½Ã·á Å©±â

Á÷°æ±âÁØ: 150¡­500 mmÀÌÇÏ

Á÷°æ±âÁØ: 150¡­500 mmÀÌÇÏ

Á÷°æ±âÁØ: 150¡­500 mmÀÌÇÏ

Á÷°æ±âÁØ: 150¡­500 mmÀÌÇÏ

À¯Àú ¿Í ÇùÀÇ

º¸¿ï(Bowl) ÀçÁú

½ºÅÙ·¹½º ¶Ç´Â NPP

½ºÅÙ·¹½º ¶Ç´Â NPP

½ºÅÙ·¹½º ¶Ç´Â NPP

½ºÅÙ·¹½º ¶Ç´Â NPP

º»Ã¼ ÀçÁú

Suss, ½ºÅÙ·¹½º ÀçÁú

Suss, ½ºÅÙ·¹½º ÀçÁú

Suss, ½ºÅÙ·¹½º ÀçÁú

Suss, ½ºÅÙ·¹½º ÀçÁú

½ºÇÉ ¸ðÅÍ

½ºÇǵå ÄÜÆ®·Ñ ¸ðÅÍ

½ºÇǵå ÄÜÆ®·Ñ ¸ðÅÍ

½ºÇǵå ÄÜÆ®·Ñ ¸ðÅÍ

½ºÇǵå ÄÜÆ®·Ñ ¸ðÅÍ

ȸÀü¼ö

250¡­6000rpm

250¡­6000rpm

250¡­6000rpm

250¡­6000rpm

½Ã·áÅ©±â¿¡ µû¶ó
º¯µ¿

ȸÀü´Ü¼ö

3´Ü(¾Æ³¯·Î±× ŸÀ̸Ó)

3´Ü(¾Æ³¯·Î±× ŸÀ̸Ó)

3´Ü(¾Æ³¯·Î±× ŸÀ̸Ó)

3´Ü(¾Æ³¯·Î±× ŸÀ̸Ó)

À¯Àú ¿Í ÇùÀÇ

0.2 sec¡­500hrs

0.2 sec¡­500hrs

0.2 sec¡­500hrs

0.2 sec¡­500hrs

Àü¿ø

AC220V

AC220V

AC220V

AC220V

CDA or N2

       
À¯Àú ¿Í ÇùÀÇ

Áø°ø

200 Torr ÀÌ»ó

200 Torr ÀÌ»ó

200 Torr ÀÌ»ó

200 Torr ÀÌ»ó

ÅäÃâ ³ëÁñ °¹¼ö

       
À¯Àú ¿Í ÇùÀÇ

¿É¼Ç

½Ã·áô ±âº» 1°³

½Ã·áô ±âº» 1°³

½Ã·áô ±âº» 1°³

½Ã·áô ±âº» 1°³

         

¾ÈÀü Ä¿¹ö

¾ÈÀü Ä¿¹ö

¾ÈÀü Ä¿¹ö

¾ÈÀü Ä¿¹ö

º»Ã¼Å©±â
         
¼öµ¿Çü ¶Ç´Â ÀÚµ¿ÇüÀº À¯Àú¿Í ÇùÀÇ¿¡ ÀÇÇØ °áÁ¤ °¡´É

 

 


 

 

     

Compact integrated solution in single cabinet:

  • Full Ç÷¡½ºÆ½ ÇÏ¿ì¡ :10mm Thick NPP or
  • ÀÌÁö ÇÁ·Î¼¼½º ÄÜÆ®·ÑÀÌ °¡´ÉÇÑ Åõ¸í ÇÑ À©µµ¿ì
  • DI-water and Nitrogen spray Nozzle Located in
  • °³½º ´©Ãâ¹æÁö ¼³°èÀû¿ë
 

 

SpinDryer

SpinCoater

 

 

Coater equipped with:

  • Fully automated dosing pump
  • Dynamic movable dispense arm with constant or Rpm related speed control for maximum uniformity among whole substrate surface
  • Nitrogen dry :optionally available through lid or movable arm
  • Digitally controlled brushless motor with highly accurate speed control and acceleration selectable per recipe step
   

Portable Wand

Vacuum Wand Set

Vacuum tips

Vacuum Handles

     

 

 

Applications:

  • Drying
  • Rinse/clean
  • Etching
  • Manual coating
  • Automatic coating
  • Developing

 

 

 

     

Mask Pick - Side Grip

Mask Pick - Horizontal Grip

   
     

Manual Reticle SMIF Pod Opener, RSP150

Manual FOUP Opener, 300 mm

   
     

Automatic Wafer Presenter

Manual Five-Wafer Lift Presenter

Manual Single Wafer Presenter

21-manual-wafer-escalators

   
 


À缺ITS co.

°æ±âµµ ¾È¾ç½Ã µ¿¾È±¸ È£°è 555-9 ¾È¾ç ±¹Á¦ À¯Åë´ÜÁö 17µ¿ 127È£
 Tel : (031) 479-4211/2, Fax : (0504) 460-0288

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Contact us :contrabase26@gmail.com jsi@jsits.com