1)세부 규격
- Manual alignment and Exposure system
- Manual Load and Unload
- motor drive Alignment Mode (옵션)
- Beam size :5"diameter
- Wafer Stage : X,Y,Z and theta Axis
- Tilted wafer stage
- Mask size : up to 5" x 5"
- 300w 초고압 수은등 or LED 램프
- air cooling unit for lamp
-Double CCD zoom microscope and 21" LCD Monitor
- Oil-less Vacuum Pump
2) System Specification
① Light Source Module
-300W 초고압 수은등or LED 램프 & Power supply
- Wavelength : NUV
- 365nm Max. Intensity : > 20 mw/cm2
- Max. Beam Size :5"diameter
- Beam Uniformity :5 % 이하
②DualCCD Microscope Module
- manual moving stage : X, Y, Z Axis and tilt stage
- Moving Distance
- 500X magnification
- Objective separation : 60 mm
- Y-Axis: 10mm
- 21" LCD Monitor
- Dual optic coaxial illumination
③ Stage Module
- Stage Moving Distance
- X, Y Axis : 5 mm
- Z Axis : 25 mm
- Theta Axis: 4 degree
- Stage Resolution
- X, Y Stage Resolution: 1㎛
- Theta : 0.1 degree
- Z Axis : 10㎛
- Align accuracy : <± 1~2 um
- tilt stage
⑤ Resolution
- Vacuum Contact : 1 um ( photoresist 1um@Si Wafer )
⑥ Utility
- Dimension(mm) : 1,000mm*800mm*1450mm[W*D*H]
- Electric Power : 220V,5Amp, 50/60Hz, 1 Phase
- N2 : More than 1kg/cm2 , Flow rate 5 Liter/min
- Out side diameter 6 mm Tube
- Air : More than 1kg/cm2
- Flow rate 10 Liter/min
- Out side diameter 6 mm Tube
- Vacuum: =600mmHg, ( Vacuum pump included )
- Exhaust: Lamp House Cooling
- Flow rate 10 Liter/min
- Weight : Equipment : 120 kg
- 협의에 따라 사양은 변경 가능
용도 :MEMS ,LithoGraphy..
납품처 :인하대, 가천대, 시립대, NST,경남대 외 다수업체

|