The SU8 product line consists of chemically amplified; epoxy based
negative resists with high functionality, high optical transparency
and are sensitive to near UV radiation.
Cured films or topography are highly resistant to solvents, acids and
bases and have excellent thermal stability, making it well suited for
permanent use applications.
Material Attributes
SU8 2000
- >10:1 aspect ratio imaging with vertical sidewalls.
- <1um to >200 um in a single spin coat.
- High chemical and plasma resistance.
- Faster Drying Films.
