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Proper¼î |
Value |
Unit |
Method |
---|---|---|---|
»ö»ó(unexposed) |
¾Ïû»ö |
n.a. |
visual |
»ö»ó(exposed) |
û»ö |
n.a. |
visual |
Á¡µµ@ 20¡ÆC |
180 |
sec |
DIN Cup No.4 |
Á¡µµ@ 20¡ÆC |
850 |
mPas |
Brookfield #3 @ 50 rpm |
¹Ðµµ(liquid) |
1.05 |
g/cm©ø |
gravimetric |
¹Ðµµ(solid) |
1.25 |
g/cm©ø |
gravimetric |
°íÇü ¼ººÐ |
40 |
%wt |
gravimetric |
±¤°¨¼º(Photosensitivity) |
4 - 5 |
Stouffer SSG21 |
see processing |
Ç¥¸é |
hard- contact exposure |
n.a.
|
exposure in vacuum frame |
°ø Á¤
Process step |
°ø Á¤ Á¶ °Ç |
---|---|
Àû ¿ë |
Roller-coating with 32 to 64 mesh rubber-roller |
Flash-off |
~1 min at room temperature |
Drying |
5 - 10 min @ 80¡ÆC in convection oven |
³ë±¤(Exposure) |
100 - 200 mJ/cm©÷ (300 - 350 nm) |
Çö»ó(Developing) |
1% aqueous sodium carbonate; 35¡ÆC; 30 - 60 sec |
¿¡Äª(Etching) |
suitable for acidic media (ferric chloride, cupric chloride); limited stability in alkaline etchants (aqueous ammonia) |
¹Ú¸®(Stripping) |
2 - 5% potassium hydroxide at 50-90¡ÆC |
SYSTRONIC Roller-Coating/Drying line ÇÁ¸® Ŭ¸®´× °øÁ¤¿¡¼ ÆгÎÀº ÁÂÈĹ濡¼ ÅõÀԵ˴ϴÙ. ÆгÎÀº ÇÑÂÊÀ¸·Î ¹Ð¸®¸é¼ ÄÚÆà ÀåÄ¡ÂÊÀ¸·Î ÁøÇàÇÕ´Ï´Ù. ÄÚÅÍ´Â ÇìÆÄÇÊÅ͸¦ ÀåÄ¡ÇÑ Å¬¸°·ë ijºñ³Ý ³»ºÎ¿¡ À§Ä¡ÇÏ°í ÀÖ½À´Ï´Ù. ¾ç¸é ÄÚÆÃµÈ ÆгÎÀº ±×¸³ üÀÎÀ¸·Î µé¾î¿Ã·Á¼ °£´ÜÇÑ Ç÷¡½¬ ¿ÀÇÁ¿Í ¿ÀºìÀ¸·Î ÇâÇÕ´Ï´Ù. ¶ó¹Ì³ª ¿¡¾î Ç÷οì´Â ¿ÜºÎ¿¡¼ ÄÚÆúηΠÈ帨´Ï´Ù. ¿©±â¿¡¼ Æ÷Åä·¹Áö½ºÆ®´Â Àû¿Ü¼± ·¥ÇÁ·Î °¡¿µÇ¾îÁö¸ç °ÇÁ¶ µË´Ï´Ù. ¶óÀÎÀÇ ¸¶Áö¸·¿¡¼ ÆгÎÀº »ó¿Â¿¡¼ ³Ã°¢µÇ¸ç ´ÙÀ½ °øÁ¤ÀÇ ÅõÀÔÀ» ±â´Ù¸³´Ï´Ù. |