DiaEtch 120

º» Á¦Ç°Àº ·Ñ¶ó ÄÚÆÿ¡ ÃÖÀûÀÔ´Ï´Ù. Àû¿ëµÇ´Â ·¹Áö½ºÆ®ÀÇ µÎ²²¿¡ µû¶ó¼­ °í¹«·Ñ·¯¸¦ ¼±ÅÃÇÕ´Ï´Ù. 48 ¸Þ½¬ÀÇ ·ÑÀ» 9~11 ¸¶ÀÌÅ©·ÐÀÇ µÎ²²¿¡ »ç¿ëÇÕ´Ï´Ù(Àû´çÇÑ ½ºÇǵå¿Í ¾Ð·Â¿¡¼­).T

Ư  ¼º

Proper¼î

Value

               Unit

Method

»ö»ó(unexposed)

¾Ïû»ö

               n.a.

visual

»ö»ó(exposed)

û»ö

                n.a.

visual

Á¡µµ@ 20¡ÆC

180

               sec

DIN Cup No.4

Á¡µµ@ 20¡ÆC

850

                mPas

Brookfield #3 @ 50 rpm

¹Ðµµ(liquid)

1.05

               g/cm©ø

gravimetric

¹Ðµµ(solid)

1.25

               g/cm©ø

gravimetric

°íÇü ¼ººÐ

40

               %wt

gravimetric

±¤°¨¼º(Photosensitivity)

4 - 5

          Stouffer SSG21

see processing

Ç¥¸é

hard-

contact exposure

                 n.a.

 

exposure in vacuum frame

 

°ø  Á¤

Process step

°ø Á¤ Á¶ °Ç

Àû  ¿ë

Roller-coating with 32 to 64 mesh rubber-roller

Flash-off

~1 min at room temperature

Drying

5 - 10 min @ 80¡ÆC in convection oven

³ë±¤(Exposure)

100 - 200 mJ/cm©÷ (300 - 350 nm)

Çö»ó(Developing)

1% aqueous sodium carbonate; 35¡ÆC; 30 - 60 sec

¿¡Äª(Etching)

suitable for acidic media (ferric chloride, cupric chloride); limited stability in alkaline etchants (aqueous ammonia)

¹Ú¸®(Stripping)

2 - 5% potassium hydroxide at 50-90¡ÆC

 

RC380.jpg (532514 bytes)

SYSTRONIC Roller-Coating/Drying line

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