Lab-type dip-coater |
ÀÌ Á¦Ç°Àº µö ÄÚÆÿëÀÌ¸ç ºü¸£°Ô ±âÈÇÏ´Â ¼Öº¥Æ® (1-Propanole) ´Â ÇϴܺÎÅÍ µöÇÎÀ» ÇÒ ¶§ ºÐ´ç 12cmÀÇ ¼Óµµ·Î Áõ¹ßÇϹǷΠÆ÷Åä·¹Áö½ºÆ®(photoresist)ÀÇ ¼Õ½ÇÀÌ ¾ø½À´Ï´Ù. ÀÌ Á¦Ç°¿¡¼ Ä¿´Ù¶õ ·¹Áö½ºÆ® ºñµå¸¦ °üÂûÇÒ¼ö ¾øÀ¸¸ç Àú¼Ó(low speed)¿¡¼´Â ·¹Áö½ºÆ®ÀÇ ¹æ¿ïÁüÀÌ ¾ø½À´Ï´Ù.
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Property |
Unit |
Value |
Method |
---|---|---|---|
»ö»ó(unexposed) |
n.a. |
¾Ïû»ö |
visual |
»ö»ó(exposed) |
n.a. |
û»ö |
visual |
Viscosity @ 20¡ÆC |
sec |
90 * |
Zahn Cup No.1 |
¹Ðµµ(liquid) |
g/cm©ø |
0.9 |
gravimetric |
¹Ðµµ (solid) |
g/cm©ø |
1.25 |
gravimetric |
°íÇü ¼ººÐt |
%wt |
27.5 |
gravimetric |
±¤°¨¼º(Photosensitivity) |
Stouffer SSG21 |
4 - 5 |
see processing |
Ç¥¸é |
n.a. |
hard-contact exposure |
exposure in vacuum frame |
»ç¿ëÇϱâÀü¿¡ Á¡µµ Á¶ÀýÀÀ ÇÒ ÇÊ¿ä°¡ ¾ø½À´Ï´Ù.
°ø Á¤
Process step |
Á¶ °Ç |
---|---|
Application |
Dip-coating at withdrawal speed between 5 - 20 cm/min |
Flash-off |
1-5 min at room temperature |
°Ç Á¶ |
5 - 10 min @ 80¡ÆC in convection oven |
³ë±¤(Exposure) |
150 - 300 mJ/cm©÷ (300 - 350 nm) |
Çö»ó(Developing) |
1% aqueous sodium carbonate; 35¡ÆC; 30 - 60 sec ** |
¿¡Äª(Etching) |
suitable for acidic media (ferric chloride, cupric chloride); limited stability in alkaline etchants (aqueous ammonia) |
¹Ú¸®(Stripping) |
2 - 5% potassium hydroxide at 50-90¡ÆC |
** 110¡ÆC¿¡¼ 10ºÐµ¿¾ÈÀÇ Æ÷½ºÆ® º£ÀÌÅ©´Â Á¢Âø¼º°ú ±â°èÀû ¾ÈÁ¤¼ºÀ» Çâ»ó ½Ãŵ´Ï´Ù.